等离子刻蚀机
等离子刻蚀机-
研究了采用等离子刻蚀机对硅进行深槽刻蚀中掩蔽层的选择及横向腐蚀的抑制等工艺问题。
Mask selection and lateral etching control in Si deep etching process technology are studied .
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高密度等离子刻蚀机中的等离子体诊断技术
Diagnostics Techniques for High Density Plasma Tools
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小型等离子清洗蛐刻蚀机的应用
Application of Small Plasma Cleaning / Etching Instruments
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等离子、反应离子刻蚀机自动匹配网络的研究
Study on Automatic Network Matching for Plasma or Reactive lon Etching