类金刚石薄膜

Ti掺杂及Ti应力缓和层对类金刚石薄膜附着力的影响

The effect of Ti-doping and stress relaxation layer on adhesion strength of DLC thin film

碲镉汞衬底上沉积类金刚石薄膜的界面分析

Interface analysis of DLC film deposited on hg_ ( 1-x ) cd_xte

类金刚石薄膜中杂质Fe对其力学性能的影响

The Effect of Fe Impurity in DLC Films on Mechanical Property

γ射线与N离子辐照类金刚石薄膜的机理研究

Mechanism of Damage in Diamond like Carbon Film Induced by γ ray and N ion Irradiations

类金刚石薄膜的Raman光谱分析及红外光谱特性

The Raman and Infrared Spectra of Diamond Like Carbon Films

Ar离子辅助沉积对含氢类金刚石薄膜结构影响的计算机模拟

Simulation on Ar Ion Assisted Deposition of Hydrogen Diamond-like Carbon Films

利用等离子体浸没离子注入沉积技术（PⅢ-D）于室温下在硅片上合成了类金刚石薄膜涂层。

Using plasma immersion ion implantation - deposition ( P ⅲ - D ), DLC films are fabricated on silicon substrates at room temperature .

电解有机溶液法在Si表面制备类金刚石薄膜及退火对其结构的影响

Electrodeposition of diamond-like carbon films from organic solvents and effects of Annealing on the film structure

并模拟了C2和C（10）合成类金刚石薄膜的结构特征。

We simulated the full process of the DLC films assembled by C2 and C10 and analyzed the structure properties of the films .

用YAG激光制备类金刚石薄膜及其光学折射率研究

A Study of Optical Refractivity in Diamond-Like CArbon Films Prepared by YAG Laser Technique

本文采用脉冲电弧离子镀的方法，在p型硅上沉积类金刚石薄膜，用椭偏法测试薄膜的光学常数。

Optical properties characterization with ellipsometry of the diamond-like carbon films , grown on p-type Si substrate by pulsed arc deposition , has been successfully developed .

Si（111）表面离子束辅助沉积对类金刚石薄膜结构影响的计算机模拟

Simulations of the Structure Characteristic of Diamond-like Carbon Films Formed by Ion-beam-assisted Deposition on Silicon ( 111 ) Surface

利用脉冲碳等离子体源可以直接在Si和Ge片镀制类金刚石薄膜。

Diamond-like carbon films were directly deposited onto germanium and silicon by pulse discharge carbon plasma source .

AFM表明在类金刚石薄膜中掺入一定量的硅元素，有利于改善薄膜的表面粗糙度。

The surface roughness is improved due to the incorporation of silicon .

硼离子掺杂类金刚石薄膜及C（B）／n-Si异质结光伏特性

Diamond-like carbon films doped with b ions and photovoltaic property of c ( b ) / n-si heterojunction

可见Raman光谱分析表明：实验制得的均为典型的类金刚石薄膜。

The result of visible Raman spectrum shows that typical diamond-like carbon film can be acquired through the experiment .

采用Raman光谱、原子力显微镜、显微硬度分析仪，表征了类金刚石薄膜的微观结构、表面形貌、硬度。

Microstructure , surface morphology and hardness of the films were investigated by Raman spectroscopy , AFM and micro-hardness instrument .

PLD法制备纳米类金刚石薄膜及衬底温度的影响

Synthesis of Nanoscale Diamond-like Carbon Films by PLD and the Dependence of Substrate Temperature

基于LM算法的无氢类金刚石薄膜喇曼高斯分解

Gaussian Decomposition for Raman Spectra of hydrogen-free Diamond-Like Carbon Film Based on LM Algorithm

PECVD法制备类金刚石薄膜的结构和摩擦学性能研究

Study on microstructure and tribological properties of diamond-like carbon films deposited by PECVD

利用液相电沉积技术制备了含氢类金刚石薄膜（DLC）；

Hydrogenated diamond-like carbon ( DLC ) films were prepared by using a liquid phase electrodeposition technique .

ULSI用氟化类金刚石薄膜的研究

Study on fluorinated diamond - like carbon films for ULSI

丙酮环境下ECR微波等离子体辅助化学气相沉积类金刚石薄膜研究

Diamond-like carbon films deposited on optical glass substrate by using ECR microwave acetone plasma CVD method

Ti-Ni合金上镀制类金刚石薄膜研究

Preparation of diamond-like carbon films on Ti-Ni alloy by pulsed vacuum arc technique

用射频等离子体化学气相沉积法（RF-PECVD）制备了含氢类金刚石薄膜（DLC）。

Diamond-like carbon films were prepared by RF-PECVD .

类金刚石薄膜的扫描电镜分析表明：获得的薄膜在硅基片上是光滑和致密的，在Ti合金基片上有裂纹，高速钢基片上有微孔。

The diamond-like carbon thin film is deposited on silicon , titanium alloy and stainless steel substrate , which shows that the films on silicon substrate are smooth and intense .

类金刚石薄膜微观摩擦性能的FFM评价&针尖尺度效应

Study on Micro-tribological Properties Diamond-like Carbon Films with FFM-Tip Size Effect

类金刚石薄膜作为MgF2红外增透和保护膜的研究

Study of Diamond-like Carbon Films as Antireflection and Protection Coatings of MgF_2 Substrates

采用反应磁控溅射的方法沉积碳化钛（TiC）膜层。随后在维持镀膜系统真空度的情况下，利用等离子体分解结合高能离子轰击的方法不间断地连续制备i－C类金刚石薄膜。

The TiC film was prepared by a magnetron controlled reactive sputtering unit and then the I - C film was uninterruptedly prepared by means of plasma decomposition combined with high energy ion bombardment .

改善镀膜的质量，提高薄膜的附着力和多层镀膜能力。Ti掺杂及Ti应力缓和层对类金刚石薄膜附着力的影响

Lower water vapor partial pressure during processing for higher quality , better adhesion and more reproducible deposition . The effect of Ti-doping and stress relaxation layer on adhesion strength of DLC thin film