化学气相沉积

化学气相沉积法碳纤维表面连续涂覆B4C的研究

A Study of the Carbon Fiber Coated Continually with B_4C by CVD Method

对连续化学气相沉积过程中Nb3Sn生长特点的探讨

Growth characteristics of nb_3sn in continuous CVD process

用射频化学气相沉积法制备P型微晶金刚石薄膜

Deposition p-Type Microcrystalline diamond Films on Quartz Grass Using Radio Frequency PCVD

热丝化学气相沉积n型nc-Si：H薄膜及nc-Si：H/c-Si异质结太阳电池

Study of n-type nc-si : h films and heterojunction solar cells by HWCVD

CO2激光化学气相沉积a-Si：H薄膜

CO_2 laser chemical vapor deposition of a-Si : H film

阐述了CO2激光化学气相沉积a-Si：H薄膜的机理。

The chemical vapor deposition mechanism of a-Si : H film is described .

等离子体化学气相沉积TiN膜的刀具试验

Test of cuts with tin film by plasma chemical evaporating deposition

直流等离子体化学气相沉积TiN在塞规上的应用

The Application of DC Plasma CVD of TiN to the Plug Gauge

铝型材挤压模具等离子体化学气相沉积TiN工艺的试验研究

The Experimental Study on PCVD TIN Process for Aluminium Profile Extrusion Dies

钢基体中碳与铁对化学气相沉积TiN动力学的影响

Effects of Substrate Materials on Kinetics of Chemical Vapour Deposition of TiN

游离碳对化学气相沉积SiC纤维微结构的影响

Effects of free carbon on Microstructure of CVD SiC fiber

残余氯在等离子体增强化学气相沉积TiN膜中的偏聚过程研究

Segregation of Residual Chlorine in Plasma & Enhanced Chemical Vapor Deposited TiN Film

目前多数商业化的GaN基LED通常是在蓝宝石和SiC衬底上，通过有机物化学气相沉积生长。

Commercial GaN-based LEDs are usually grown by MOCVD on sapphire or SiC substrates .

单源化学气相沉积法制备In2O3纳米线

Preparation of In_2O_3 nanowires by single-source chemical vapor deposition method

炉温对化学气相沉积SiC涂层组成及显微结构的影响

Effect of Furnace Temperature on the Composition and Microstructure of SiC Coatings by CVD

等离子体化学气相沉积参量对Ar等离子体电子特性的影响

Effect of plasma chemical vapor deposition parameters on electron property in Ar plasma

沉积温度对等离子增强化学气相沉积TiN薄膜内应力的影响

Effect of deposition temperature on the internal stresses in plasma-enhanced chemical vapour-deposited tin thin films

化学气相沉积工艺制备SiC涂层

SiC Coatings Prepared by Chemical Vapor Deposition

常压化学气相沉积法制备Ti5Si3薄膜及其镀膜玻璃

A ti_5si_3 thin film and its coating glass deposited by atmospheric pressure chemical vapor deposition method

化学气相沉积TiN技术在模具表面强化中的应用研究

Study on the application of chemical vapor deposition of TiN coatings in dies surface strengthening treatment

氧分压对化学气相沉积法合成ZnO纳米结构形貌的影响

Effect of Oxygen Partial Pressure on the Morphology of ZnO Nanostructure Prepared by Chemical Vapor Deposition

用连续化学气相沉积法制取Nb3Ge的研究

Preparation of nb_3ge by a continuous CVD process research group of nb_3ge

利用化学气相沉积工艺制备了SiC涂层，对涂层进行了SEM及XRD分析。

SEM and XRD are used to determine microstructure and crystallographic form of SiC coatings by CVD .

化学气相沉积法制备TiC涂层的相组成和表面形貌

Phase Composition and Surface Morphology of TiC Coating by Chemical Vapor Deposition

钢基体上化学气相沉积TiC涂层的显微组织及形成机理研究

The microstructure and growth mechanism of CVD TiC coatings on steel matrixes

循环氩离子轰击-等离子体增强化学气相沉积TiN膜组织与性能研究

Structure and properties of repeated Ar + bombardment-plasma enhanced chemical vapour deposition ( pecvd ) TiN Films

在等离子体辅助化学气相沉积金刚石的设备中，在Si（111）基体上进行沉积金刚石薄膜的实验。

The diamond film was prepared on Si ( 111 ) by the plasma assistant hot-filament chemical vapor deposition .

N2O为氧源金属有机化学气相沉积生长ZnO薄膜的光学性能研究

Optical Properties of ZnO Thin Film Grown by Atmospheric Pressure-Metal Organic Chemical Vapor Deposition Using N_2O as Oxygen Precursor

化学气相沉积（CVD）碳化硅厚膜的实验研究

An Experimental Study of Chemical Vapour Deposition ( CVD ) of Silicon Carbide

采用催化剂裂解化学气相沉积的方法，用化学共沉淀法制备的Co催化剂，高产率的制备了多壁碳纳米管。

Using the Co catalysts produced by chemical co-deposition , the carbon nanotubes were synthesized by the catalytic chemical vapor decomposition method .