zrn
- 网络氮化锆;氮化锆陶瓷靶材;原点回归;回参考点;原点复归
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Study of the erosion and friction properties of ZrN films
氮化锆薄膜腐蚀和摩擦性能的研究
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At present there has a lot of deposited methods about ZrN .
目前关于氮化锆薄膜的制备方法很多,直流反应溅射技术由于存在着阳极消失和迟滞效应的缺陷,严重的影响了薄膜的沉积速率。
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Chromatic prediction model based on artificial neural network for ZrN films
基于人工神经网络的氮化锆薄膜颜色预测模型
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Influence of Copper Sputtering on Thermal Stability of ZrN Diffusion Barrier
溅射Cu膜方式对ZrN扩散阻挡层热稳定性的影响
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Effect of Nitrogen Partial Pressure on Color of ZrN
氮分压对氮化锆薄膜颜色的影响规律研究
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Process and Property of the ZrN Coating Made by Vacuum Arc Ion Plating
真空电弧离子镀ZrN涂层的工艺与性能
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Preparation and Performance of the ZrN Films on Dental Materials
口腔材料表面氮化锆薄膜制备工艺与性能
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And the deposition rates of both TiN and ZrN also change .
TiN和ZrN层的沉积速率随调制周期的变化而变化。
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Effect of Solid Particles Erosion on Erosion Resistance of ZrN Coated Titanium Alloy
固体颗粒冲蚀对钛合金ZrN涂层抗冲蚀性能的影响
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Influence of Substrate Direction on Properties of Multi-arc Ion Plating ZrN Coatings
基片方向对多弧离子镀ZrN涂层性能的影响
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The Effects of Negative Substrate Bias Sputtering on the Characterization of ZrN Film
衬底负偏压溅射对ZrN薄膜性能的影响研究
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Colority and technological parameters in preparation of ZrN thin films
氮化锆薄膜色度特性与工艺参数研究
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ZrN Films Deposited by the Technology of The Intermediate Frequency Reactive Magnetron Sputtering
采用中频反应磁控溅射技术沉积氮化锆薄膜
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Effect of the Diluent on the Combustion Synthesis of ZrN
稀释剂对燃烧合成ZrN的影响
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Tribological Performance of ZrN Ceramic Thin Films with Ti Additions
掺杂不同钛含量氮化锆薄膜的制备及其摩擦性能研究
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Research on Microstructure and Property of ZrN Film on HSS Surface by Vacuum Arc Depositing
高速钢表面真空电弧沉积ZrN薄膜的组织与性能研究
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Effect of interface and preferred orientation on the hardness of TiN / ZrN multilayers
界面和择优取向对TiN/ZrN纳米多层膜硬度变化的影响
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The air oxidation experiments revealed that yttrium ion implantation could greatly the oxidation resistance of ZrN coatings .
钇离子注入能够改善ZrN膜层的抗氧化性能。
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ZrN / Si_3N_4 multilayers with different Si_3N_4 thickness were synthesized by reactive magnetic sputtering .
一系列不同Si3N4层厚度的ZrN/Si3N4纳米多层膜通过反应磁控溅射法制备。
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All multilayered coatings had lower compressive stress than the average value of ZrN and W monolithic coatings .
多层膜的压应力都低于两单质薄膜应力的平均值。
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Synthesis of Multilayered Gradient CrN / ZrN Film s
CrN/ZrN多层梯度薄膜的合成
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TiN / ZrN multilayers with different modulation periods were grown by reactive RF magnetron sputtering .
利用射频反应磁控溅射方法,设计并制备了一系列不同调制周期的TiN/ZrN纳米多层膜。
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The results show that ZrN / n-GaAs Schottky bar-riers have excellent electrical characteristics and thermal stability .
结果表明ZrN/GaAs势垒有良好的电特性和高温稳定性。
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It was found that ZrN coating is mainly composed of ( 111 ) preferred orientation of ZrN phase ;
结果表明,ZrN涂层成分主要为(111)择优取向的ZrN相;
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Corrosion behavior of ZrN gradient and Zr / ZrN multilayer coatings deposited by cathodic arc ion plating
阴极电弧离子镀ZrN梯度膜和Zr/ZrN多层膜的腐蚀特性
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Multilayered gradient CrN / ZrN films were synthesized by means of DC magnetron stuttering .
利用直流磁控溅射技术,应用双靶轮流反应溅射工艺,制备了CrN/ZrN多层梯度薄膜。
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Crystallization of Si_3N_4 and superhardness effect of ZrN / Si_3N_4 nano-multilayers
Si3N4的晶体化和ZrN/Si3N4纳米多层膜的超硬效应
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Cu film deposited on ZrN and TaN diffusion barriers is annealed in vacuum and H2 , N2 mixed gas respectively .
沉积在ZrN,TaN阻挡层上的Cu膜分别在真空和氢气、氮气的混合气氛下退火。
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Characteristics of ZrN / n-GaAs Schottky Barriers
ZrN/n-GaAs肖特基势垒特性研究
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When the temperature is lower than 500 ℃, both TiO_2 / ZrO_2 and TiN / ZrN can be found in the multilayer .
当退火低于500℃时,多层膜表面的几层被氧化成TiO2/ZrO2多层膜,但内层仍为TiN/ZrN多层膜;